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Engineering Research Equipment Center

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ULSIƒo[ƒ`ƒƒƒ‹ƒtƒ@ƒNƒgƒŠ[

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“ñŽŸƒCƒIƒ“Ž¿—Ê•ªÍŠí SIMS

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“dŽq‘¹Ž¸•ªŒõ‘•’u HREELS

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ƒCƒIƒ“•ªŒõ‘•’u

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ƒŒ[ƒU[‹¤Å“_Œ°”÷‹¾ CAISIS

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’´‚^‹óƒGƒbƒ`ƒ“ƒO‘•’u UHV etching

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XüŒõ“dŽq•ªŒõ‘•’u ƒT[ƒ‚ƒGƒŒƒNƒgƒƒ“Š”Ž®‰ïŽÐ SigmaProbe

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‘–¸Œ^ŒuŒõXü•ªÍ‘•’u Š”Ž®‰ïŽÐƒŠƒKƒN ZSX PrimusII

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•²––‚wü‰ñÜ‘•’u Š”Ž®‰ïŽÐƒŠƒKƒN Ultima IV

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”÷¬E”––ŒXü‰ñÜ‘•’u Š”Ž®‰ïŽÐƒŠƒKƒN SmartLab

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ICDDŒŸõƒVƒXƒeƒ€ PDF-4 +2010CPDF-4/Organic 2011

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•ªŒõŒõ“xŒv Š”Ž®‰ïŽÐ“‡’лìŠ UV-3600

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‘–¸Œ^“dŽqŒ°”÷‹¾ Š”Ž®‰ïŽÐ“ú–{“dŽq JSM-6390LV

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“€Œ‹Š£‘‡‘•’u “ú–{“dŽqŠ”Ž®‰ïŽÐ JFD-300

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ƒCƒIƒ“ƒXƒpƒbƒ^ƒŠƒ“ƒO‘•’u “ú–{“dŽqŠ”Ž®‰ïŽÐ JFC-1100E

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EPMAŽºEŽŽ—¿ì»Žº

“dŽqüƒ}ƒCƒNƒƒAƒiƒ‰ƒCƒU Š”Ž®‰ïŽÐ“‡’лìŠ EPMA-1720H

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’f–ʃCƒIƒ“ƒ~ƒŠƒ“ƒO Š”Ž®‰ïŽÐ“ú—§ƒnƒCƒeƒNƒmƒƒW[ƒX E-3500

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ŽÀ‘ÌŒ°”÷‹¾ Š”Ž®‰ïŽÐƒ‰ƒCƒJƒ}ƒCƒNƒƒVƒXƒeƒ€ƒY M205C

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Ž©“®Œ¤–‘•’u ƒrƒ…[ƒ‰[ ƒƒ^ƒU[ƒu250 + ƒxƒNƒgƒ‹LC250

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ƒvƒ‰ƒYƒ}ƒNƒŠ[ƒi[ YHS-R

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‹àƒXƒpƒbƒ^ƒŠƒ“ƒOEƒJ[ƒ{ƒ“ö’…‘•’u “ú—§ƒnƒCƒeƒNƒmƒƒW[ƒX E-1010

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ƒ†ƒjƒo[ƒTƒ‹ƒY[ƒ€Œ°”÷‹¾ ƒjƒRƒ“ MULTIZOOM AZ100

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–œ”\ŽŽŒ±‹@ “‡’лìŠUH-1000kNAŒ^

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“§‰ßŒ^“dŽqŒ°”÷‹¾ FEI TECNAI F20

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W‘©ƒCƒIƒ“ƒr[ƒ€ (Focused Ion Beam) Š”Ž®‰ïŽÐ“ú—§ƒnƒCƒeƒNƒmƒƒW[ƒY NB5000

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